This International Standard gives guidelines for the definition and classification of defects in GaN epitaxial film grown on SiC substrate. They are identified and described on the basis of examples, mainly by schematic illustrations, optical microscope images, and transmission...
1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...
1.1 This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanic
1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...
This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanic
1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...
1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...
1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...
1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...
This Japanese Industrial Standard specifies requirements for portable microbe imaging scopes (hereafter referred to as imaging scopes) that enable observation of bacterium and other microbes mainly at the site of food processing facilities based on the imaging technique of an optical...
1.1 This test method covers measurement of the local thickness of metal and oxide coatings by the microscopical examination of cross sections using an optical microscope. 1.2 Under good conditions, when using an optical microscope, the method is capable of giving an...
This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. Such residual stress determinations are of importance in evaluating the nature and degree of residual stresses...
This standard describes the sampling procedures and methods for the determination of particle concentration and size distribution. Three methods are specified. One uses an automatic particle size analyser, working on the light interruption principle. The other two use an optical...
This standard describes the sampling procedures and methods for the determination of particle concentration and size distribution. Three methods are specified. One uses an automatic particle size analyser, working on the light interruption principle. The other two use an optical...
1.1 This test method covers measurement of the local thickness of metal and oxide coatings by the microscopical examination of cross sections using an optical microscope. 1.2 Under good conditions, when using an optical microscope, the method is capable of giving an...