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IEC 63229 - Semiconductor devices – Classification of defects in gallium nitride epitaxial film on silicon carbide substrate
April 1, 2021 - IEC

This International Standard gives guidelines for the definition and classification of defects in GaN epitaxial film grown on SiC substrate. They are identified and described on the basis of examples, mainly by schematic illustrations, optical microscope images, and transmission...

ASTM C978-04(2019) - Standard Test Method for Photoelastic Determination of Residual Stress in a Transparent Glass Matrix Using a Polarizing Microscope and Optical Retardation Compensation Procedures
February 1, 2019 - ASTM International

1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...

ASTM E2244-11(2018) - Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
May 1, 2018 - ASTM International

1.1 This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an...

ASTM C978-04(2014) - Standard Test Method for Photoelastic Determination of Residual Stress in a Transparent Glass Matrix Using a Polarizing Microscope and Optical Retardation Compensation Procedures
May 1, 2014 - ASTM International

1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...

ASTM E2244 - Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
November 1, 2011 - ASTM

This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric...

ASTM C978-04(2009) - Standard Test Method for Photoelastic Determination of Residual Stress in a Transparent Glass Matrix Using a Polarizing Microscope and Optical Retardation Compensation Procedures
May 1, 2009 - ASTM International

1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...

ASTM C978-04 - Standard Test Method for Photoelastic Determination of Residual Stress in a Transparent Glass Matrix Using a Polarizing Microscope and Optical Retardation Compensation Procedures
June 1, 2004 - ASTM International

1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...

ASTM C978-02 - Standard Test Method for Photoelastic Determination of Residual Stress in a Transparent Glass Matrix Using a Polarizing Microscope and Optical Retardation Compensation Procedures
April 10, 2002 - ASTM International

1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...

ASTM C978-87(1996) - Standard Test Method for Photoelastic Determination of Residual Stress in a Transparent Glass Matrix Using a Polarizing Microscope and Optical Retardation Compensation Procedures
April 10, 2002 - ASTM International

1.1 This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. 1.2 Such residual stress determinations are of importance in evaluating the nature and degree of residual...

JIS B 7271 - Portable microbe imaging scope
March 20, 2019 - JSA

This Japanese Industrial Standard specifies requirements for portable microbe imaging scopes (hereafter referred to as imaging scopes) that enable observation of bacterium and other microbes mainly at the site of food processing facilities based on the imaging technique of an optical...

ASTM B487-85(2013) - Standard Test Method for Measurement of Metal and Oxide Coating Thickness by Microscopical Examination of Cross Section
December 1, 2013 - ASTM International

1.1 This test method covers measurement of the local thickness of metal and oxide coatings by the microscopical examination of cross sections using an optical microscope. 1.2 Under good conditions, when using an optical microscope, the method is capable of giving an...

ASTM C978 - Standard Test Method for Photoelastic Determination of Residual Stress in a Transparent Glass Matrix Using a Polarizing Microscope and Optical Retardation Compensation Procedures
June 1, 2004 - ASTM

This test method covers the determination of residual stresses in a transparent glass matrix by means of a polarizing microscope using null or retardation compensation procedures. Such residual stress determinations are of importance in evaluating the nature and degree of residual stresses...

JIS B 7148 - Microscope eyepieces
February 1, 1992 - JSA
A description is not available for this item.
NNN-S-450 - SLIDE, MICROSCOPE
NPFC
A description is not available for this item.
MS 36148 - DESK, MICROSCOPE
NPFC
A description is not available for this item.
A-A-50831 - SLIDE, MICROSCOPE
NPFC
A description is not available for this item.
DS/EN 60970 - Insulating liquids - Methods for counting and sizing particles
October 11, 2007 - DS

This standard describes the sampling procedures and methods for the determination of particle concentration and size distribution. Three methods are specified. One uses an automatic particle size analyser, working on the light interruption principle. The other two use an optical...

IEC 60970 - Insulating liquids – Methods for counting and sizing particles
July 1, 2007 - IEC

This standard describes the sampling procedures and methods for the determination of particle concentration and size distribution. Three methods are specified. One uses an automatic particle size analyser, working on the light interruption principle. The other two use an optical...

ASTM B487-85(2007) - Standard Test Method for Measurement of Metal and Oxide Coating Thickness by Microscopical Examination of a Cross Section
March 1, 2007 - ASTM International

1.1 This test method covers measurement of the local thickness of metal and oxide coatings by the microscopical examination of cross sections using an optical microscope. 1.2 Under good conditions, when using an optical microscope, the method is capable of giving an...

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