IEC - TS 62607-6-8
Nanomanufacturing – Key control characteristics – Part 6-8: Graphene – Sheet resistance: In-line four-point probe
| Organization: | IEC |
| Publication Date: | 1 June 2023 |
| Status: | active |
| Page Count: | 26 |
| ICS Code (Nanotechnologies): | 07.120 |
scope:
This part of IEC TS 62607 establishes a method to determine the key control characteristic
• sheet resistance RS [measured in ohm per square (Ω/sq)],
by the
• in-line four-point probe method, 4PP.
The sheet resistance RS is derived by measurements of four-terminal electrical resistance performed on four electrodes placed on the surface of the planar sample.
• The measurement range for RS of the graphene samples with the method described in this document goes from 10−2 Ω/sq to 104 Ω/sq.
• The method is applicable for CVD graphene provided it is transferred to quartz substrates or other insulating materials (quartz, SiO2 on Si, as well as graphene grown from silicon carbide.
• The method is complementary to the van der Pauw method (IEC 62607-6-7) for what concerns the measurement of the sheet resistance and can be useful when it is not possible to reliably place contacts on the sample boundary.
Document History
