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CRC - NE10745

Nanofabrication by Ion-Beam Sputtering : Fundamentals and Applications

active, Most Current
Organization: CRC
Publication Date: 27 November 2012
Status: active
Page Count: 366
scope:

Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attractive. This book reviews various fascinating results, understand the underlying physics of ion induced pattern formation, to highlight the potential applications of the patterned surfaces, and to explore the patterning behavior by different irradiation parameters in order to create desired surface morphologies on specific materials.

Document History

NE10745
November 27, 2012
Nanofabrication by Ion-Beam Sputtering : Fundamentals and Applications
Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning...
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