CRC - Handbook of Thin Film Process Technology: 98/1 Reactive Sputtering

Organization: CRC
Publication Date: 29 November 2017
Page Count: 90
scope:

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.

Author: David A Glocker

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