NEN-ISO 14706
Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total reflection X-ray fluorescence (TXRF) spectroscopy
active, Most Current
| Organization: | NEN |
| Publication Date: | 1 February 2001 |
| Status: | active |
| Page Count: | 34 |
| ICS Code (Chemical analysis): | 71.040.40 |
scope:
Specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces. The method is applicable to: - elements of atomic number from 16 (S) to 92 (U); - contamination element with atomic surface densities from 1x1010 atoms/cm² to 1x1014 atoms/cm²; - contamination element with atomic surface densities from 5x108 atoms/cm² to 5x1012 atoms/cm² using a VPD specimen preparation method.
Document History
NEN-ISO 14706
February 1, 2001
Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total reflection X-ray fluorescence (TXRF) spectroscopy
Specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces. The method is applicable to: -...