NEN-ISO 23812
Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
active, Most Current
| Organization: | NEN |
| Publication Date: | 1 April 2009 |
| Status: | active |
| Page Count: | 29 |
| ICS Code (Chemical analysis): | 71.040.40 |
scope:
This International Standard specifies a procedure for calibrating the depth scale in a shallow region, less than 50 nm deep, in SIMS depth profiling of silicon, using multiple delta-layer reference materials. This International Standard is applicable to single-crystalline silicon, polycrystalline silicon and amorphous silicon.
Document History
NEN-ISO 23812
April 1, 2009
Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
This International Standard specifies a procedure for calibrating the depth scale in a shallow region, less than 50 nm deep, in SIMS depth profiling of silicon, using multiple delta-layer reference...