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ASTM E2246

Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer

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Organization: ASTM
Publication Date: 1 November 2011
Status: active
Page Count: 21
ICS Code (Photographic paper, films and plates. Cartridges): 37.040.20
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This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric microscope. Measurements from cantilevers that are touching the underlying layer are not accepted.

This test method uses a non-contact optical interferometric microscope with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.

This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.

This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

Document History

ASTM E2246
November 1, 2011
Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can...
November 1, 2011
Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can...
November 1, 2011
Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can...
November 1, 2005
Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can...
October 10, 2002
Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can...

References

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