ISO DIS 22415
Surface chemical analysis - Secondary ion mass spectrometry - Method for determining yield volume in argon cluster sputter depth profiling of organic materials
|Publication Date:||19 July 2018|
|ICS Code (Chemical analysis):||71.040.40|
This International Standard specifies a method by which the argon cluster sputtering yield volume of a specific organic material shall be measured and reported. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness on a flat substrate which has a different chemical composition to the specified material. This International Standard is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This International Standard is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.