DIN EN 62418
Semiconductor devices - Metallization stress void test (IEC 62418:2010); German version EN 62418:2010
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| Organization: | DIN |
| Publication Date: | 1 December 2010 |
| Status: | active |
| Page Count: | 19 |
| ICS Code (Metallic coatings): | 25.220.40 |
| ICS Code (Semiconductor devices in general): | 31.080.01 |
Document History
DIN EN 62418
December 1, 2010
Semiconductor devices - Metallization stress void test (IEC 62418:2010); German version EN 62418:2010
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