ISO DIS 21466

Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM

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Organization: ISO
Publication Date: 30 November 2018
Status: active
Page Count: 45
ICS Code (Optical equipment): 37.020
scope:

This International Standard specifies three-dimensional (3D) structure model with related parameters, file format and fitting procedure for characterizing 3D critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the modelbased library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 5 nm

Document History

ISO DIS 21466
November 30, 2018
Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM
This International Standard specifies three-dimensional (3D) structure model with related parameters, file format and fitting procedure for characterizing 3D critical dimension (CD) values for wafer...

References

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