NEN-ISO 21466
Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM
active, Most Current
| Organization: | NEN |
| Publication Date: | 1 January 2020 |
| Status: | active |
| Page Count: | 58 |
| ICS Code (Optical equipment): | 37.020 |
scope:
This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.
Document History
NEN-ISO 21466
January 1, 2020
Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM
This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a...