DIN 51456
Testing of materials for semiconductor technology - Surface analysis of silicon wafers by multielement determination in aqueous analysis solutions using mass spectrometry with inductively coupled plasma (ICP-MS)
inactive
| Organization: | DIN |
| Publication Date: | 1 October 2012 |
| Status: | inactive |
| Page Count: | 14 |
| ICS Code (Integrated circuits. Microelectronics): | 31.200 |
Document History
October 1, 2013
Testing of materials for semiconductor technology - Surface analysis of silicon wafers by multielement determination in aqueous analysis solutions using mass spectrometry with inductively coupled plasma (ICP-MS)
Dieses Dokument legt ein Verfahren zur Bestimmung der Massenanteile der Elemente Al (Aluminium), As (Arsen), Ba (Barium), Be (Beryllium), Ca (Calcium), Cd (Cadmium), Co (Kobalt), Cr (Chrom), Cu...
DIN 51456
October 1, 2012
Testing of materials for semiconductor technology - Surface analysis of silicon wafers by multielement determination in aqueous analysis solutions using mass spectrometry with inductively coupled plasma (ICP-MS)
A description is not available for this item.