The chip-resistant coating covered by this specification is
intended for use on areas of military vehicles or ground support
equipment which may encounter wear and abrasion. The coating is a
100 percent solids, two-component chemical cure lining used in
protecting profiled, cleaned, and primed (when required) wood,
concrete, rigid plastic, fiberglass, elastomeric plastic, and metal
substrates. The coating and lining system is intended for
protection against abrasion, stone and gravel impact, mild
chemicals, corrosion, vibration, and sound emission over a wide
temperature range. This material is designed for use as a durable
spray-on protective layer for thermal insulation and abrasion
resistance on vehicle interior surfaces such as doors and floors,
and abrasion-prone vehicle exterior surfaces such as wheel wells,
undercarriages, footsteps, equipment storage areas and beds for
tactical, combat, and construction equipment. A durable trowel-on
repair compound is also covered in this specification.
This coating can be made from a wide variety of chemistries,
such as polyurethane, polyurea, and a combination of polyurea and
polyurethane (hybrid coating). Regardless of chemistry, the coating
cannot contain any hazardous TDI or any free monomers of MDI or its
most common isomers 2,2', 2,4', and 4,4' MDI or HDI. The coating
can be aromatic or aliphatic in nature.
The material can be applied with a variety of application
equipment ranging from high volume production plural component
equipment to moderate volume static mix cartridge guns and small
volume spot repair kits. The approximate film thickness is
dependent on the particular application needs. A general guideline
is to use approximately 50 mils (0.050 inch) of coating thickness
in high use or chip prone areas like wheel wells, undercarriages,
and other similar areas and lower film thicknesses (approximately
20 mils) in less demanding application areas like vehicle
interiors. The material can easily be repaired with small volume
repair kits and readily bonds with itself.
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