UNLIMITED FREE ACCESS TO THE WORLD'S BEST IDEAS

close
Already an Engineering360 user? Log in.

This is embarrasing...

An error occurred while processing the form. Please try again in a few minutes.

Customize Your Engineering360 Experience

close
Privacy Policy

This is embarrasing...

An error occurred while processing the form. Please try again in a few minutes.

ASTM F672

STANDARD TEST METHOD FOR MEASURING RESISTIVITY PROFILES PERPENDICULAR TO THE SURFACE OF A SILICON WAFER USING A SPREADING RESISTANCE PROBE

inactive
Buy Now
Organization: ASTM
Publication Date: 29 May 1987
Status: inactive
Page Count: 23
ICS Code (Semiconducting materials): 29.045

Document History

June 10, 2001
Standard Test Method for Measuring Resistivity Profiles Perpendicular to the Surface of a Silicon Wafer Using a Spreading Resistance Probe
1. Scope 1.1 This test method covers measurement of the resistivity profile perpendicular to the surface of a silicon wafer of known orientation and type. 1.2 This test method may be used on...
January 1, 1988
Standard Test Method for Measuring Resistivity Profiles Perpendicular to the Surface of a Silicon Wafer Using a Spreading Resistance Probe
1. Scope 1.1 This test method covers measurement of the resistivity profile perpendicular to the surface of a silicon wafer of known orientation and type. NOTE 1--This test method may also be...
ASTM F672
May 29, 1987
STANDARD TEST METHOD FOR MEASURING RESISTIVITY PROFILES PERPENDICULAR TO THE SURFACE OF A SILICON WAFER USING A SPREADING RESISTANCE PROBE
A description is not available for this item.
May 25, 1984
STANDARD METHOD FOR MEASURING RESISTIVITY PROFILE PERPENDICULAR TO THE SURFACE OF A SILICON WAFER USING A SPREADING RESISTANCE PROBE
A description is not available for this item.
Advertisement