ASTM F1049
STANDARD TEST METHOD FOR SHALLOW ETCH PIT DETECTION ON SILICON WAFERS
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| Organization: | ASTM |
| Publication Date: | 31 October 1988 |
| Status: | inactive |
| Page Count: | 3 |
| ICS Code (Semiconducting materials): | 29.045 |
Document History
December 10, 2002
Standard Practice for Shallow Etch Pit Detection on Silicon Wafers
This practice is used to detect shallow etch pits, which may be related to the level of metallic impurities near the surface of silicon epitaxial or polished wafers. This practice is not recommended...
June 10, 2000
Standard Practice for Shallow Etch Pit Detection on Silicon Wafers
This practice is used to detect shallow etch pits, which may be related to the level of metallic impurities near the surface of silicon epitaxial or polished wafers. This practice is not recommended...
January 1, 1995
Standard Practice for Shallow Etch Pit Detection on Silicon Wafers
1. Scope 1.1 This practice is used to detect shallow etch pits, which may be related to the level of metallic impurities near the surface of silicon epitaxial or polished wafers. 1.2 This practice is...
June 29, 1990
STANDARD TEST METHOD FOR SHALLOW ETCH PIT DETECTION ON SILICON WAFERS
A description is not available for this item.
ASTM F1049
October 31, 1988
STANDARD TEST METHOD FOR SHALLOW ETCH PIT DETECTION ON SILICON WAFERS
A description is not available for this item.
May 29, 1987
STANDARD TEST METHOD FOR SHALLOW ETCH PIT DETECTION ON SILICON WAFERS
A description is not available for this item.