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ASTM F399

STANDARD TEST METHOD FOR THICKNESS OF HETEROEPITAXIAL OR POLYSILICON LAYERS

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Organization: ASTM
Publication Date: 27 January 1984
Status: inactive
Page Count: 5
ICS Code (Semiconducting materials): 29.045

Document History

ASTM F399
December 10, 2000
Standard Test Method for Thickness of Heteroepitaxial or Polysilicon Layers
1. Scope 1.1 This test method covers the determination of thickness of silicon heteroepitaxial or polysilicon layers deposited under conditions such that the interface region between the deposited...
ASTM F399
June 10, 2000
Standard Test Method for Thickness of Heteroepitaxial or Polysilicon Layers
1. Scope 1.1 This test method covers the determination of thickness of silicon heteroepitaxial or polysilicon layers deposited under conditions such that the interface region between the deposited...
ASTM F399
January 1, 1988
Standard Test Method for Thickness of Heteroepitaxial or Polysilicon Layers
1. Scope 1.1 This test method covers the determination of thickness of silicon heteroepitaxial or polysilicon layers deposited under conditions such that the interface region between the deposited...
ASTM F399
January 27, 1984
STANDARD TEST METHOD FOR THICKNESS OF HETEROEPITAXIAL OR POLYSILICON LAYERS
A description is not available for this item.
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