ASTM International - ASTM F388-84
Method for Measurement of Oxide Thickness on Silicon Wafers and Metallization Thickness by Multiple-Beam Interference (Tolansky Method) (Withdrawn 1993)
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| Organization: | ASTM International |
| Publication Date: | 1 January 1984 |
| Status: | inactive |
| Page Count: | 6 |
| ICS Code (Semiconducting materials): | 29.045 |
Document History
ASTM F388-84
January 1, 1984
Method for Measurement of Oxide Thickness on Silicon Wafers and Metallization Thickness by Multiple-Beam Interference (Tolansky Method) (Withdrawn 1993)
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