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ASTM International - ASTM F518-77(1991)E01

Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Banks and Semiconductor Wafers During Etching (Withdrawn 1996)

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Organization: ASTM International
Publication Date: 1 January 1977
Status: inactive
Page Count: 5

Document History

ASTM F518-77(1991)E01
January 1, 1977
Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Banks and Semiconductor Wafers During Etching (Withdrawn 1996)
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