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ASTM International - ASTM F1513-99(2003)

Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications

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Organization: ASTM International
Publication Date: 10 December 1999
Status: inactive
Page Count: 2
ICS Code (Integrated circuits. Microelectronics): 31.200
scope:

1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets).

1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging.

1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.

abstract:

This specification sets purity grade levels, physical attributes, analytical methods, and packaging of three grades of pure unalloyed aluminum source materials for electronic thin film... View More

Document History

June 1, 2011
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications (Withdrawn 2020)
1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The...
ASTM F1513-99(2003)
December 10, 1999
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The...
December 10, 1999
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The...
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