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ASTM International - ASTM E684-95(2000)

Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces

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Organization: ASTM International
Publication Date: 10 April 2000
Status: inactive
Page Count: 2
ICS Code (Measurement of electrical and magnetic quantities): 17.220.20
scope:

1.1 This practice describes a simple and approximate method for determining the shape and current density of ion beams. The practice is limited to ion beams of diameter greater than 0.5 mm of the type used for sputtering of solid surfaces to obtain sputter depth profiles. It is assumed that the ion-beam current density is symmetrical about the beam axis.

1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Document History

ASTM E684-95(2000)
April 10, 2000
Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
1.1 This practice describes a simple and approximate method for determining the shape and current density of ion beams. The practice is limited to ion beams of diameter greater than 0.5 mm of the...
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