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ASTM International - ASTM E2244-11e1

Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer

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Organization: ASTM International
Publication Date: 1 November 2011
Status: inactive
Page Count: 14
ICS Code (Photographic paper, films and plates. Cartridges): 37.040.20
significance And Use:

5.1 In-plane length measurements can be used in calculations of parameters, such as residual strain and Young's modulus.

5.2 In-plane deflection measurements are required for specific test... View More

scope:

1.1 This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric microscope.

1.2 There are other ways to determine in-plane lengths. Using the design dimensions typically provides more precise in-plane length values than using measurements taken with an optical interferometric microscope. (Interferometric measurements are typically more precise than measurements taken with an optical microscope.) This test method is intended for use when interferometric measurements are preferred over using the design dimensions (for example, when measuring in-plane deflections and when measuring lengths in an unproven fabrication process).

1.3 This test method uses a non-contact optical interferometric microscope with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.

1.4 The maximum in-plane length measured is determined by the maximum field of view of the interferometric microscope at the lowest magnification. The minimum deflection measured is determined by the interferometric microscope's pixel-to-pixel spacing at the highest magnification.

1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Document History

May 1, 2018
Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
1.1 This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanical systems...
November 1, 2011
Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
1.1 This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanical systems...
ASTM E2244-11e1
November 1, 2011
Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
1.1 This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanical systems...
November 1, 2005
Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
1.1 This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanical systems...
October 10, 2002
Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
1.1 This test method covers a procedure for measuring in-plane lengths (including deflections) of patterned thin films. It applies only to films, such as found in microelectromechanical systems...
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