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ASTM International - ASTM F1152-02

Standard Test Method for Dimensions of Notches on Silicon Wafers (Withdrawn 2003)

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Organization: ASTM International
Publication Date: 10 January 2002
Status: inactive
Page Count: 4
ICS Code (Semiconducting materials): 29.045
scope:

This standard was transferred to SEMI (www.semi.org) May 2003

1.1 This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits.

1.2 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.

1.3 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Document History

January 10, 2002
Standard Test Method for Dimensions of Notches on Silicon Wafers
1.1 This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits. 1.2 The values stated in SI...
January 10, 2002
Standard Test Method for Dimensions of Notches on Silicon Wafers
1.1 This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits. 1.2 The values stated in SI...
ASTM F1152-02
January 10, 2002
Standard Test Method for Dimensions of Notches on Silicon Wafers (Withdrawn 2003)
This standard was transferred to SEMI (www.semi.org) May 2003 1.1 This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers...
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