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ASTM International - ASTM F1630-00

Standard Test Method for Low Temperature FT-IR Analysis of Single Crystal Silicon for III-V Impurities (Withdrawn 2003)

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Organization: ASTM International
Publication Date: 10 December 2000
Status: inactive
Page Count: 6
ICS Code (Semiconducting materials): 29.045
scope:

This standard was transferred to SEMI (www.semi.org) May 2003

1.1 This test method covers the determination of electrically active boron, phosphorus, arsenic, aluminum, antimony, and gallium concentration in single crystal silicon.

1.2 This test method can be used for silicon in which the impurity/dopant concentrations are between 0.01 ppba and 5.0 ppba for each of the electrically active elements.

1.3 The concentration for each impurity/dopant can be obtained by application of Beer's Law. Calibration factors are given for each element.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Document History

ASTM F1630-00
December 10, 2000
Standard Test Method for Low Temperature FT-IR Analysis of Single Crystal Silicon for III-V Impurities (Withdrawn 2003)
This standard was transferred to SEMI (www.semi.org) May 2003 1.1 This test method covers the determination of electrically active boron, phosphorus, arsenic, aluminum, antimony, and gallium...
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