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ASTM F996

Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current-Voltage Characteristics

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Organization: ASTM
Publication Date: 10 May 1998
Status: inactive
Page Count: 6
ICS Code (Transistors): 31.080.30
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1. Scope

1.1 This test method covers the use of the subthreshold charge separation technique for analysis of ionizing radiation degradation of a gate dielectric in a metal-oxide-semiconducter-field-effect transistor (MOSFET) and an isolation dielectic in a parasitic MOSFET. The subthreshold technique is used to separate the ionizing radiation-induced inversion voltage shift, δV INV into voltage shifts due to oxide trapped charge,δ V ot and interface traps,δ V it. This technique uses the pre- and post-irradiation drain to source current versus gate voltage characteristics in the MOSFET subthreshold region.

1.2 Procedures are given for measuring the MOSFET subthreshold current-voltage characteristics and for the calculation of results.

1.3 The application of this test method requires the MOSFET to have a substrate (body) contact.

1.4 Both pre- and post-irradiation MOSFET subthreshold source or drain curves must follow an exponential dependence on gate voltage for a minimum of two decades of current.

1.5 The values given in SI units are to be regarded as standard. No other units of measurement are included in this test method.

1.6 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Document History

January 1, 2011
Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift Into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current–Voltage Characteristics
This test method covers the use of the subthreshold charge separation technique for analysis of ionizing radiation degradation of a gate dielectric in a metal-oxidesemiconductor- field-effect...
January 1, 2011
Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift Into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current–Voltage Characteristics
This test method covers the use of the subthreshold charge separation technique for analysis of ionizing radiation degradation of a gate dielectric in a metal-oxide-semiconducter-field-effect...
May 1, 2010
Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift Into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current–Voltage Characteristics
This test method covers the use of the subthreshold charge separation technique for analysis of ionizing radiation degradation of a gate dielectric in a metal-oxide-semiconducter-field-effect...
ASTM F996
May 10, 1998
Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current-Voltage Characteristics
1. Scope 1.1 This test method covers the use of the subthreshold charge separation technique for analysis of ionizing radiation degradation of a gate dielectric in a...
May 10, 1998
Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current-Voltage Characteristics
This test method covers the use of the subthreshold charge separation technique for analysis of ionizing radiation degradation of a gate dielectric in a metal-oxide-semiconducter-field-effect...
January 1, 1992
Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current-Voltage Characteristics
A description is not available for this item.
February 22, 1991
STANDARD TEST METHOD FOR SEPARATING A TOTAL-DOSE- INDUCED MOSFET THRESHOLD VOLTAGE SHIFT INTO COMPONENTS DUE TO OXIDE TRAPPED HOLES AND INTERFACE STATES USING THE SUBTHRESHOLD TECHNIQUE
A description is not available for this item.
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