ASTM F907
Standard Test Method for Measurement of Rotational Acceleration of a Wafer for Photoresist Spin Coating
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| Organization: | ASTM |
| Publication Date: | 25 January 1985 |
| Status: | inactive |
| Page Count: | 4 |
Document History
ASTM F907
January 25, 1985
Standard Test Method for Measurement of Rotational Acceleration of a Wafer for Photoresist Spin Coating
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