ASTM F518
Standard Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Blanks and Semiconductor Wafers During Etching
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| Organization: | ASTM |
| Publication Date: | 24 June 1977 |
| Status: | inactive |
| Page Count: | 5 |
Document History
ASTM F518
June 24, 1977
Standard Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Blanks and Semiconductor Wafers During Etching
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