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ASTM F518

Standard Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Blanks and Semiconductor Wafers During Etching

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Organization: ASTM
Publication Date: 24 June 1977
Status: inactive
Page Count: 5

Document History

ASTM F518
June 24, 1977
Standard Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Blanks and Semiconductor Wafers During Etching
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