ASTM International - ASTM F416-94
Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998)
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| Organization: | ASTM International |
| Publication Date: | 1 January 1994 |
| Status: | inactive |
| Page Count: | 11 |
| ICS Code (Semiconducting materials): | 29.045 |
Document History
ASTM F416-94
January 1, 1994
Test Method for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 1998)
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