BSI - BS ISO 17109
Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondaryion mass spectrometry sputter depth profiling using single and multi-layer thin films
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| Organization: | BSI |
| Publication Date: | 31 August 2015 |
| Status: | active |
| Page Count: | 28 |
| ICS Code (Chemical analysis): | 71.040.40 |
Document History
April 30, 2022
Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
A description is not available for this item.
BS ISO 17109
August 31, 2015
Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondaryion mass spectrometry sputter depth profiling using single and multi-layer thin films
A description is not available for this item.