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NAVY - OPNAV 3960.16B - (N8) NAVY TEST, MEASUREMENT, AND DIAGNOSTIC EQUIPMENT, AUTOMATIC TEST SYSTEMS, AND METROLOGY AND CALIBRATION Organization: NAVY
Date: 2017-11-07
Description: To set policy, establish procedures, and assign responsibilities for the execution of the Navy test, measurement, and diagnostic equipment; automatic test systems; and metrology and calibration program and supporting information resource management for the Chief of Naval Operations (CNO) to be used in the program objective memorandum planning, programming, budgeting, and execution phases.
TSE ISO/IEC GUIDE 99 - INTERNATIONAL VOCABULARY OF METROLOGY ? BASIC AND GENERAL CONCEPTS AND ASSOCIATED TERMS (VIM) Organization: TSE
Date: 2013-02-21
Description: In this Vocabulary, a set of definitions and associated terms isgiven, in English and French, for a system of basic and generalconcepts used in metrology, together with concept diagrams todemonstrate their relations.
ISO/IEC GUIDE 99 - INTERNATIONAL VOCABULARY OF METROLOGY - BASIC AND GENERAL CONCEPTS AND ASSOCIATED TERMS (VIM) - FIRST EDITION Organization: ISO
Date: 2007-01-01
Description: In this Vocabulary, a set of definitions and associated terms is given, in English and French, for a system of basic and general concepts used in metrology, together with concept diagrams to demonstrate their relations.
DS/ISO/IEC GUIDE 99 - INTERNATIONAL VOCABULARY OF METROLOGY - BASIC AND GENERAL CONCEPTS AND ASSOCIATED TERMS (VIM) Organization: DS
Date: 2008-02-14
Description: In this Vocabulary, a set of definitions and associated terms is given, in English and French, for a system of basic and general concepts used in metrology, together with concept diagrams to demonstrate their relations.
NASA-LLIS-0720 - LESSONS LEARNED – STAR IMAGE METROLOGY PART II: IRRADIANCE MEASUREMENTS Organization: NASA
Date: 2000-03-29
Description: Here we will use "star image." This guideline provides information on instruments and procedures used in measuring star image irradiance distributions.
CSA ISO/IEC 15944-9 - INFORMATION TECHNOLOGY - BUSINESS OPERATIONAL VIEW - PART 9: BUSINESS TRANSACTION TRACEABILITY FRAMEWORK FOR COMMITMENT EXCHANGE Organization: CSA
Date: 2016-01-01
Description: The word “traceability” as used in this Part of ISO/IEC 15944 does not relate to metrology and thus the specification of metrological traceability is not addressed in this Part of ISO/IEC 15944.
IEC 61115 - EXPRESSION OF PERFORMANCE OF SAMPLE HANDLING SYSTEMS FOR PROCESS ANALYZERS - EDITION 1.0 Organization: IEC
Date: 1992-03-01
Description: Scope and object This International Standard specifies the tests which should be carried out to determine the functional performance of sample handling systems. In addition it specifies the information to be provided by the manufacturers and users of such systems.
ASME B89.4.10 - METHODS FOR PERFORMANCE EVALUATION OF COORDINATE MEASURING SYSTEMS SOFTWARE - ERRATUM SEPTEMBER 2003 Organization: ASME
Date: 2000-01-01
Description: A critical issue in industrial coordinate metrology is the measurement of a work piece to assure compliance with its dimensional requirements.
ISO 22093 - INDUSTRIAL AUTOMATION SYSTEMS AND INTEGRATION — PHYSICAL DEVICE CONTROL — DIMENSIONAL MEASURING INTERFACE STANDARD (DMIS) - SECOND EDITION Organization: ISO
Date: 2011-05-15
Description: DMIS conveys the product and equipment definitions along with the process and reporting information necessary to perform dimensional measurements that employ coordinate metrology. DMIS contains product definitions for nominal features, feature constructions, dimensional and geometric tolerances, functional datums, and part coordinate systems.
SAE/TP - 2011-01-2651 - CAM-BASED PLANNING, PROGRAMMING AND EXECUTION OF LARGE-SCALE MACHINING OPERATIONS BY A ROBOT-MOUNTED GANTRY SYSTEM Organization: SAE/TP
Date: 2011-10-18
Description: A custom user interface for online process monitoring was created as well as online cell program management capabilities to accommodate the large quantity of trajectory information. The system went from conceptual, to prototypelevel to full production mode, thereby covering several Manufacturing Readiness Levels (MRL).
CRC - KE11920 - LASER-BASED MEASUREMENTS FOR TIME AND FREQUENCY DOMAIN APPLICATIONS : A HANDBOOK Organization: CRC
Date: 2016-04-19
Description: Accessible to scientists, postdoc researchers, and advanced undergraduate students, this self-contained book gives a wide-ranging, balanced overview of the areas—including frequency standards and clocks, ultra-high-precision spectroscopy, quantum information, and environmental metrology—revolutionized by the recent advent of optical frequency comb synthesizers (OFCSs) based on femtosecond mode-locked lasers.
WILEY - OPTICAL SHOP TESTING - OPTICAL SHOP TESTING 3RD EDITION COMPLETE DOCUMENT Organization: WILEY
Date: 2006-01-01
Description: In addition to new chapters and modified material, this revised edition also includes information on: Testing of aspheric wavefronts, compensators, and null configurations Zernike polynomial and wavefront fitting Optical metrology of diffuse objects Angle, prism, curvature, and focal length measurements Mathematical representation of an optical surface and its characteristics Intended for anyone engaged in optical shop testing, this essential textbook also includes a CD-ROM with an exhaustive list of resources and two programs for Windows, which will be useful when teaching or working in optical testing.
CRC - KE22920 - DRILLS : SCIENCE AND TECHNOLOGY OF ADVANCED OPERATIONS Organization: CRC
Date: 2014-04-08
Description: It includes detailed explanations of the design features, tool manufacturing and implementation practices, metrology of drilling and drilling tools, and the tool failure analysis.
NPFC - DI-QCIC-80278 - CALIBRATION AND MEASUREMENTS REQUIREMENTS SUMMARY (CMRS) Organization: NPFC
Date: 2017-01-23
Description: The CMRS DID satisfies the requirements of the 5000-series DoD directives; AFI 21-113, Air Force Metrology and Calibration (AFMETCAL) Management; AR 750-43, Army Test, Measurement, and Diagnostic Equipment; NAVELEX 4355.2 and MCO 4733.1B, Marine Corps Test, Measurement, and Diagnostic Equipment (TMDE) Calibration and Maintenance Program (CAMP).
CRC - HE5153 - MICROLITHOGRAPHY : SCIENCE AND TECHNOLOGY, SECOND EDITION Organization: CRC
Date: 2007-05-11
Description: New in the Second EditionIn addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography.
SNZ NZS 5259 - GAS MEASUREMENT Organization: SNZ
Date: 2015-11-27
Description: The details in section 3 have been reordered to align more closely with the performance statements of section 2 and updated to reflect the latest metrology technology. Detailed testing methods and equipment arrangements are in the appendices, and an audit checklist is included to assist in assessing compliance.
AGMA 14FTM04 - RELIABLE MEASUREMENTS OF LARGE GEARS Organization: AGMA
Date: 2014-10-01
Description: This is part of a joint research project, within which also a new measurement standard of 2 m in diameter has been developed. Lastly, information about a Joint Research Project within the European Metrology Research Program which will start in September 2014 is provided.
MCGRAW - SEMICONDUCTOR MANUFACTURI - SEMICONDUCTOR MANUFACTURING HANDBOOK, SECOND EDITION Organization: MCGRAW
Date: 2018-01-01
Description: Coverage includes: • Nanotechnology and microsystems manufacturing • FinFET and nanoscale silicide formation • Physical design for high-performance, low-power 3D circuits • Epitaxy, anneals, RTP, and oxidation • Microlithography, etching, and ion implantation • Physical, chemical, electrochemical, and atomic layer vapor deposition • Chemical mechanical planarization • Atomic force metrology • Packaging, bonding, and interconnects • Flexible hybrid electronics • Flat-panel, flexible display electronics, and photovoltaics • Gas distribution systems • Ultrapure water and filtration • Process chemicals, handling, and abatement • Chemical and slurry handling systems • Yield management, CIM, and factory automation • Manufacturing execution systems • Advanced process control • Airborne molecular contamination • ESD controls in cleanroom environments • Vacuum systems and RF plasma systems • IC manufacturing parts cleaning technology • Vibration and noise design • And much more  Authors: Hwaiyu Geng, CMfgE, PE
ISO DIS 11929-1 - DETERMINATION OF THE CHARACTERISTIC LIMITS (DECISION THRESHOLD, DETECTION LIMIT AND LIMITS OF THE COVERAGE INTERVAL) FOR MEASUREMENTS OF IONIZING RADIATION - FUNDAMENTALS AND APPLICATION - PART 1: ELEMENTARY APPLICATIONS Organization: ISO
Date: 2017-11-01
Description: This International Standard specifies a procedure, in the field of ionizing radiation metrology, for the calculation of the “decision threshold”, the “detection limit” and the “limits of the coverage interval” for a non-negative ionizing radiation measurand when counting measurements with preselection of time or counts are carried out.
ISO DIS 11929-2 - DETERMINATION OF THE CHARACTERISTIC LIMITS (DECISION THRESHOLD, DETECTION LIMIT AND LIMITS OF THE COVERAGE INTERVAL) FOR MEASUREMENTS OF IONIZING RADIATION - PART 2: ADVANCED APPLICATIONS Organization: ISO
Date: 2017-11-01
Description: This International Standard specifies a procedure, in the field of ionizing radiation metrology, for the calculation of the “decision threshold”, the “detection limit” and the “limits of the coverage interval” for a non-negative ionizing radiation measurand when counting measurements with preselection of time or counts are carried out.

1 - 20 of 29 results