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This standard was transferred to SEMI (www.semi.org) May 2003 1.1 These test methods cover the identification and quantification of organic contaminants on silicon wafer surfaces using a gas chromatograph interfaced to a mass spectrometer (GC-MS) or a phosphorus selective detector, or...
This standard sets performance requirements for wafer carriers used in cleanrooms by evaluating the ability of these products to limit fire spread and smoke damage. All requirements in this standard shall be met in order for these products to be eligible to receive Approval recognition....
This standard was transferred to SEMI (www.semi.org) May 2003 1.1 This guide defines standardized positions for measuring diameter of circular wafers of silicon and other semiconducting materials that contain flats or notches on the periphery. It was developed for use with silicon...
1. Scope 1.1 This practice covers the size calibration of a scanning surface inspection system (SSIS) by observing the distribution of monodisperse polystyrene latex (PSL) spheres that have been pre-deposited in controlled fashion on the front surface of a clean, unpatterned, polished or epitaxial...
This standard was transferred to SEMI (www.semi.org) May 2003 1.1 This practice covers an inspection procedure for determining the surface quality of silicon wafers that have been polished on one side. 1.2 This practice is intended as a large-volume acceptance method and does not...
