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NFPA 318

Standard for the Protection of Semiconductor Fabrication Facilities

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Organization: NFPA
Publication Date: 1 January 2018
Status: active
Page Count: 40
scope:

This standard applies to semiconductor fabrication facilities and comparable fabrication processes, including research and development areas in which hazardous chemicals are used, stored, and handled and containing what is herein defined as a cleanroom or clean zone, or both.

Purpose. This standard is intended to provide reasonable safeguards for the protection of facilities containing cleanrooms from fire and related hazards. These safeguards are intended to provide protection against injury, loss of life, and property damage.

Document History

NFPA 318
January 1, 2018
Standard for the Protection of Semiconductor Fabrication Facilities
This standard applies to semiconductor fabrication facilities and comparable fabrication processes, including research and development areas in which hazardous chemicals are used, stored, and handled...
January 1, 2015
Standard for the Protection of Semiconductor Fabrication Facilities
This standard applies to semiconductor fabrication facilities and comparable fabrication processes, including research and development areas in which hazardous chemicals are used, stored, and handled...
January 1, 2012
Standard for the Protection of Semiconductor Fabrication Facilities
This standard applies to semiconductor fabrication facilities and comparable fabrication processes, including research and development areas in which hazardous chemicals are used, stored, and handled...
January 1, 2009
Standard for the Protection of Semiconductor Fabrication Facilities
This standard applies to semiconductor fabrication facilities and comparable research and development areas in which hazardous chemicals are used, stored, and handled and containing what is herein...
August 18, 2005
Standard for the Protection of Semiconductor Fabrication Facilities
This standard applies to semiconductor fabrication facilities and comparable research and development areas in which hazardous chemicals are used, stored, and handled and containing what is herein...
July 19, 2002
Standard for the Protection of Semiconductor Fabrication Facilities
A description is not available for this item.
318
July 19, 2002
Standard for the Protection of Semiconductor Fabrication Facilities
A description is not available for this item.
July 19, 2002
Standard for the Protection of Semiconductor Fabrication Facilities
A description is not available for this item.
August 18, 2000
Standard for the Protection of Cleanrooms
A description is not available for this item.
August 5, 1998
Standard for the Protection of Cleanrooms
A description is not available for this item.
January 1, 1995
Standard for the Protection of Cleanrooms
A description is not available for this item.
February 10, 1992
STANDARD FOR THE PROTECTION OF CLEANROOMS
A description is not available for this item.

References

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