NEN-ISO 17331
Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
active
| Organization: | NEN |
| Publication Date: | 1 June 2004 |
| Status: | active |
| Page Count: | 30 |
| ICS Code (Chemical analysis): | 71.040.40 |
scope:
This International Standard specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method. This International Standard applies to iron and/or nickel atomic surface densities from 6 × 109 atoms/cm2 to 5 × 1011 atoms/cm2.
Document History
July 1, 2010
Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
A description is not available for this item.
NEN-ISO 17331
June 1, 2004
Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
This International Standard specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method...