DIN EN 62047-14
Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials (IEC 47F/59/CD:2010)
inactive
| Organization: | DIN |
| Publication Date: | 1 October 2010 |
| Status: | inactive |
| Page Count: | 29 |
| ICS Code (Electromechanical components in general): | 31.220.01 |
| ICS Code (Semiconductor devices in general): | 31.080.01 |
Document History
October 1, 2012
Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials (IEC 62047-14:2012); German version EN 62047-14:2012
In diesem Teil der IEC 62047 sind Begriffe und Verfahren zum Ermitteln der Grenzformänderung (Formänderungsvermögen) von metallischen Dünnschichtwerkstoffen mit Dicken im Bereich von 0,5 μm bis 300...
DIN EN 62047-14
October 1, 2010
Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials (IEC 47F/59/CD:2010)
A description is not available for this item.
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