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VDI/VDE 5575 BLATT 4

X-ray optical systems - X-ray mirrors and X-ray mirror systems - Total reflection mirrors and multilayer mirrors

active, Most Current
Organization: VDI
Publication Date: 1 September 2018
Status: active
Page Count: 19
ICS Code (Optical measuring instruments): 17.180.30
scope:

This standard addresses users, developers and producers of X-ray mirrors. Typical application fields are laboratory equipment using X-rays, e.g., for diffraction, spectroscopy, scattering, tomography, and microscopy as well as instrumentation for synchrotron radiation at electron storage rings and free-electron-lasers. Further application fields are EUV-lithography and X-ray astrophysics.

Document History

VDI/VDE 5575 BLATT 4
September 1, 2018
X-ray optical systems - X-ray mirrors and X-ray mirror systems - Total reflection mirrors and multilayer mirrors
This standard addresses users, developers and producers of X-ray mirrors. Typical application fields are laboratory equipment using X-rays, e.g., for diffraction, spectroscopy, scattering,...
October 1, 2017
X-ray optical systems - X-ray mirrors and X-ray mirror systems - Total reflection mirrors and multilayer mirrors
A description is not available for this item.
August 1, 2011
X-ray optical systems - X-ray mirrors - Total reflection mirrors and multilayer mirrors
This guideline deals with reflective X-ray optical systems, which use total reflection as well as Bragg reflection on inner interfaces of a multilayer structure to influence the spectral composition...
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