ISO 21859
Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
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| Organization: | ISO |
| Publication Date: | 1 June 2019 |
| Status: | active |
| Page Count: | 10 |
| ICS Code (Advanced ceramics): | 81.060.30 |
scope:
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.
Document History
ISO 21859
June 1, 2019
Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in...