UNLIMITED FREE
ACCESS
TO THE WORLD'S BEST IDEAS

SUBMIT
Already a GlobalSpec user? Log in.

This is embarrasing...

An error occurred while processing the form. Please try again in a few minutes.

Customize Your GlobalSpec Experience

Finish!
Privacy Policy

This is embarrasing...

An error occurred while processing the form. Please try again in a few minutes.

ISO 21859

Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

active, Most Current
Buy Now
Organization: ISO
Publication Date: 1 June 2019
Status: active
Page Count: 10
ICS Code (Advanced ceramics): 81.060.30
scope:

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

Document History

ISO 21859
June 1, 2019
Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in...

References

Advertisement