ISO 16531
Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
inactive
Buy Now
| Organization: | ISO |
| Publication Date: | 1 June 2013 |
| Status: | inactive |
| Page Count: | 26 |
| ICS Code (Chemical analysis): | 71.040.40 |
scope:
This International Standard specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.
Document History
October 1, 2020
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
This document specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger...
ISO 16531
June 1, 2013
Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
This International Standard specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions...