Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials
|Publication Date:||1 December 2015|
|ICS Code (Chemical analysis):||71.040.40|
This International Standard gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
This International Standard is not intended to cover the use of special multilayered systems such as delta doped layers.