ISO 14237
Surface Chemical Analysis - Secondary-Ion Mass Spectrometry - Determination of Boron Atomic Concentration in Silicon Using Uniformly Doped Materials
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| Organization: | ISO |
| Publication Date: | 1 February 2000 |
| Status: | inactive |
| Page Count: | 28 |
| ICS Code (Chemical analysis): | 71.040.40 |
Document History
July 15, 2010
Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials
This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials...
ISO 14237
February 1, 2000
Surface Chemical Analysis - Secondary-Ion Mass Spectrometry - Determination of Boron Atomic Concentration in Silicon Using Uniformly Doped Materials
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