ASTM F1152
STANDARD TEST METHOD FOR DIMENSIONS OF NOTCHES ON SILICON WAFERS
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| Organization: | ASTM |
| Publication Date: | 27 May 1988 |
| Status: | inactive |
| Page Count: | 3 |
| ICS Code (Semiconducting materials): | 29.045 |
Document History
January 10, 2002
Standard Test Method for Dimensions of Notches on Silicon Wafers
This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits. The values stated in SI units are to...
August 15, 1993
Standard Test Method for Dimensions of Notches on Silicon Wafers
Scope This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits. The values stated in SI units...
January 1, 1993
Standard Test Method for Dimensions of Notches on Silicon Wafers
1. Scope 1.1 This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits. 1.2 The values stated in...
ASTM F1152
May 27, 1988
STANDARD TEST METHOD FOR DIMENSIONS OF NOTCHES ON SILICON WAFERS
A description is not available for this item.