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ASTM F1152

Standard Test Method for Dimensions of Notches on Silicon Wafers

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Organization: ASTM
Publication Date: 10 January 2002
Status: inactive
Page Count: 3
ICS Code (Semiconducting materials): 29.045
scope:

This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits.

The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.

This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Document History

ASTM F1152
January 10, 2002
Standard Test Method for Dimensions of Notches on Silicon Wafers
This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits. The values stated in SI units are to...
August 15, 1993
Standard Test Method for Dimensions of Notches on Silicon Wafers
Scope This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits. The values stated in SI units...
January 1, 1993
Standard Test Method for Dimensions of Notches on Silicon Wafers
1. Scope 1.1 This test method covers a nondestructive procedure to determine whether or not the dimensions of fiducial notches on silicon wafers fall within specified limits. 1.2 The values stated in...
May 27, 1988
STANDARD TEST METHOD FOR DIMENSIONS OF NOTCHES ON SILICON WAFERS
A description is not available for this item.
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