ISO 14706
Surface Chemical Analysis - Determination of Surface Elemental Comtamination on Silicon Wafers by Total-Reflection X-Ray Fluorescence (TXRF) Spectroscopy
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| Organization: | ISO |
| Publication Date: | 15 December 2000 |
| Status: | inactive |
| Page Count: | 30 |
| ICS Code (Chemical analysis): | 71.040.40 |
Document History
August 1, 2014
Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
This International Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces. The...
ISO 14706
December 15, 2000
Surface Chemical Analysis - Determination of Surface Elemental Comtamination on Silicon Wafers by Total-Reflection X-Ray Fluorescence (TXRF) Spectroscopy
A description is not available for this item.