BSI - BS EN 62047-16

Semiconductor devices — Micro-electromechanical devices Part 16: Test methods for determining residual stresses of MEMS films — Wafer curvature and cantilever beam deflection methods

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Organization: BSI
Publication Date: 31 July 2015
Status: active
Page Count: 18
ICS Code (Other semiconductor devices): 31.080.99

Document History

BS EN 62047-16
July 31, 2015
Semiconductor devices — Micro-electromechanical devices Part 16: Test methods for determining residual stresses of MEMS films — Wafer curvature and cantilever beam deflection methods
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