ASTM International - ASTM F1709-97(2002)
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
|Publication Date:||10 December 2002|
|ICS Code (Electronic display devices):||31.120|
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.