ASTM International - ASTM F1709-97(2008)
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
inactive
Buy Now
| Organization: | ASTM International |
| Publication Date: | 15 June 2008 |
| Status: | inactive |
| Page Count: | 3 |
| ICS Code (Electronic display devices): | 31.120 |
scope:
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
abstract:
This specification covers high purity titanium sputtering targets for use as raw material in the fabrication of semiconductor electronic thin films. Material covered by this specification... View More
Document History
May 1, 2016
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2 This standard sets purity grade levels, physical...
ASTM F1709-97(2008)
June 15, 2008
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
This specification covers high purity titanium sputtering targets for use as raw material in the fabrication of semiconductor electronic thin films. Material covered by this specification comprises...
December 10, 2002
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2 This standard sets purity grade levels, physical attributes,...
January 1, 1996
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices. 1.2 This standard sets purity grade levels, physical attributes,...
Related Products
Searching for related products...