ASTM International - ASTM F1709-97(2016)
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
Organization: | ASTM International |
Publication Date: | 1 May 2016 |
Status: | active |
Page Count: | 3 |
ICS Code (Electronic display devices): | 31.120 |
scope:
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
abstract:
This specification covers high purity titanium sputtering targets for use as raw material in the fabrication of semiconductor electronic thin films. Material covered by this specification... View More